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Semiconductor manufacturing demands ultra-pure water (UPW) and high-purity chemical handling with zero particulate contamination. Equipment must achieve non-destructive flow, minimal metallic ion release, and surface finishes below Ra 0.5μm to comply with stringent standards like SEMI F57. Processes often involve aggressive chemicals and require compatibility with CIP/SIP protocols to maintain aseptic conditions.
Key challenges include microscopic particle generation from equipment, dead zones in piping leading to contamination, and leakage risks in chemical distribution systems. Solutions must offer electro-polished surfaces, leak-tight seals, and materials that prevent ion release while supporting high-purity fluid transfer.
If required, Donjoy meets these needs with electro-polished centrifugal pumps (e.g., SCLX series) featuring qualified surfaces for UPW systems, ensuring minimal particulate shedding. Diaphragm valves with PTFE seals provide dead-leg-free flow and leak-tight performance for chemical handling, fully compliant with SEMI and ASME BPE guidelines.
